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Myfab
Realize your nano vision
Myfab
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Education & Training
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Project Examples
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Access and Support
Resources
Process service, Electrum
Project examples
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Resources
Project examples
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Project examples
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Myfab
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Myfab
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Myfab National Access - Full Description
Myfab User Meeting
Myfab and NorFab User Meeting 2013
Myfab User Meeting 2011
Myfab User Meeting 2009
History & Future
About us
Steering Board
Operational Management
News
Services
User Access
Myfab Pricing
Process Service & Collaboration
Training & Education
Chalmers
Education & Training
Resources
All tools
Cleanroom info
Project Examples
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Access and Support
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Epitaxy
Thin film deposition
Lithography
Dry etching
Thermal processes
Wet processes
Other processes
Dice mounting
Materials and Device Characterization
All tools
Process service, Electrum
Aluminium etching process
Atomic Layer Deposition
Coater and Developer Cluster
Epitaxial deposition of III/V-based compounds
Nitride deposition process
Oxidation and temperature anneal
Oxide etching process
Project examples
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Technologies
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Electron Microscopy and Nanoengineering
Emerging Electronics
Experimental Magnetism
Materials in Medicine
Nanotechnology and Functional Materials
Primateria AB
Thin Film Solar Cells
Ångström SpaceTechnology Center
Resources
All tools
Cleanroom laboratory
Process laboratory
Analysis laboratory
Project examples
About Us
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Myfab
Chalmers
NFL Staff
Göran Alestig
Christer Andersson
Johan Andersson
Henrik Frederiksen
Mattias Fredriksson
Mats Hagberg
John Halonen
Karin Hedsten
Martin Hollertz
Piotr Jedrasik
Fredrik Johansson
Petra Johansson
Niclas Lindvall
Kaija Matikainen
Peter Modh
Bengt Nilsson
Johan Persson
Svante Pålsson
Göran Reivall
Marcus Rommel
Mahdad Sadeghi
Lars-Åke Sidenberg
Ulf Södervall
KTH/Acreo
Electrum staff
Lund University
Uppsala University
Chalmers
//
Resources
//
All tools
All tools
Name
Manufacturer
Model
Current toolratetype name
Details
Microscope - Olympus MX40 - Silicon area
Olympus
MX40
A
Details
4-point probe - CMT SR2000N
AIT
CMT-SR2000N
B
Details
Ellipsometer - Sagax Isoscope
Sagax
Isoscope
B
Details
Microscope - Olympus MX50 - III/V area
Olympus
MX50
A
Details
Surface profiler - Tencor P15
KLA Tencor
P-15
B
Details
SEM - JEOL JSM 6301F
JEOL Ltd.
JSM6301F
C
Details
Ellipsometer - J.A. Woollam M2000
J.A. Woollam
M2000
C
Details
Surface profiler - Wyko NT 1100 - Optical
Veeco
NT 1100
C
Details
Parameter Analyzer - Keithley 4200SCS
Keithley
4200-SCS
B
Details
Microscope - Olympus MX50 - Metrology area
Olympus
MX50
A
Details
Microscope stereo - Olympus SZH-11
Olympus
SZH-10
A
Details
Wafer Inspection System - IR
-
-
A
Details
Software - SPM/AutoCAD
HP
140
B
Details
Wet Bench - Acid & Base - Developer Spinner
BLE
-
A
Details
Mask aligner - Suss MA/BA 6 #1
Suss MicroTec
MA/BA 6
C
Details
Wet Bench - Acid/Base - Developer Work
Stangl
Stangl
A
Details
Mask aligner - Suss MJB3 UV 400 #1
Karl Suss
MJB3
C
Details
EBL - JEOL JBX 9300FS
JEOL Ltd.
JBX9300FS
E
Details
Spinner - BLE
BLE
BLE
A
Details
Spinner - Suss LabSpin6 & Low temp hotplates
Suss Microtech
-
A
Details
Spinner - Suss LabSpin6
Suss Microtech
-
A
Details
Mask aligner - Suss MJB2
Karl Suss
MJB2
C
Details
Mask aligner - Suss MJB3 DUV
Karl Suss
MJB3 DUV
C
Details
Dry etch Stripper - TePla
TePla AG
300PC
C
Details
Ozone Cleaning - FHR
FHR Anlagenbau GmbH
UVOH 150
B
Details
Surface profiler - Tencor AS500 #1
Tencor
AS500
B
Details
Surface profiler - Tencor AS500 #2
KLA Tencor
AS500
B
Details
Fume Hood - Solvent
Stangle
Wetbench
A
Details
Fume Hood - Acid & Base - Hot Acid Work
Stangl
236
A
Details
EBL Sample pre-aligner
Chalmers MC2
PAMS 1101
A
Details
Microscope stereo - Olympus SZX-9 - PL1
Olympus
SZX-9
A
Details
Spinner - Laurell & hotplates - Unconventional resists
Laurell + BLE
WS-400B-6NPP-LITE-IND + Delta200_Hotplates
A
Details
Wet Bench - Solvent - Development work & Hot Plate
Stangl + BLE
Wetbench
A
Details
Spinner - Suss LabSpin6 & High temp hotplates
Suss Microtech
-
A
Details
Wet Bench - Solvent - Developer Work
Stangl
Wetbench
A
Details
Wet Bench - Hotplate & HMDS & Oven
Stangl
Stangl
A
Details
Microscope - Olympus MX50 - Nano area
Olympus
MX50
A
Details
Mask aligner - Suss MJB3 UV 400 #2
Karl Suss
MJB3
C
Details
Substrate bonder - Suss SB6
-
-
C
Details
PECVD - STS
STS
PECVD
C
Details
Dry etch ICP - STS - Deep Silicon etch
STS
STS ICP
D
Details
Sputter - FHR
FHR
MS150
D
Details
Sputter - NORDIKO
Nordiko
2000
B
Details
RTP - STEAG
Steag
SHS 100M
C
Details
Dry etch ICP - Oxford Plasmalab 100 - Two chambers
Oxford Plasma Technology
Plasmalab 100 ICP180
D
Details
Evaporator - Varian
Varian
VT 118 UHV
C
Details
Sputter - Balzers
Balzers/Pfeiffer
PLS 550
C
Details
Furnace - Wet oxidation
Chalmers
Furnace for III/V materials
C
Details
Dry etch RIBE - Oxford Ionfab 300
Oxford Plasma Technology
Ionfab 300
C
Details
Scriber - Suss - Soft wafers
-
-
A
Details
Dry etch IBE - Oxford Ionfab 300
Oxford Plasma Technology
Ionfab 300
C
Details
Dry etch RIE - Advanced Vacuum
PlasmaTherm/Advanced Vacuum
Batchtop m/91
C
Details
Dry etch RIE - Plasma-Therm
Plasmatherm
BatchTop m/95
C
Details
Evaporator - AVAC
AVAC
HVC600
C
Details
Evaporator - Edwards
Edwards
Auto 306
C
Details
Sputter - Pfeiffer
Pfeiffer Vacuum
SLS-630G "Spider"
C
Details
Sputter - AJA
AJA International
AJA Orion 6-UD
D
Details
Sputter - DCA - Ferroelectrics
DCA
MTD 620
D
Details
RTP - AccuThermo AW610 - InP
Allwin21
AccuThermo AW610
C
Details
RTP - AccuThermo AW610 - Wide bandgap
Allwin21
AccuThermo AW610
C
Details
Evaporator - Lesker Spectros
Lesker
Spectros
D
Details
RTP - JIPELEC JetFirst 100
JIPELEC
JetFirst 100
C
Details
Furnace - Thermolyne - BCB cure
Barnstead Thermolyne
47900
A
Details
RTP - JIPELEC JetFirst 200
JIPELEC
JetFirst 200
C
Details
Vacuum oven - Hereaus
Hereaus
#500
A
Details
Spinner - BLE & Oven
Stangl
#501
A
Details
Wet Bench - Solvent - Mask cleaning
Stangl
505
A
Details
Buffing tool - LCtec - LCD line
LC-tec AB
?
C
Details
Aligner & Assembler - Ciposa - LCD line
Ciposa SA
Switzerland
B
Details
Vacuum packer - LCD line
Multivac
509.5
A
Details
UV illumination box
Solectro AB
??
A
Details
Wet Bench - Solvent - Ultrasonic bath - Microwave line
PM-plast
Wet bench
A
Details
Wet Bench - Acid & Base - Developer Bath - Microwave line
PM-plast
Wet bench
A
Details
Wet Bench - Acid & Base - Developer Work - Microwave line
PM-plast
Wet bench
A
Details
Spinner - BLE & HMDS hotplate - Microwave line
PM-plast
Wet bench
A
Details
Hotplate - Solar-semi & BLE - Microwave line
PM-plast
Wet bench
A
Details
Quartz tube cleaner
-
-
A
Details
Wet Bench - Solvent
Stangl
Stangl
A
Details
Wet Bench - Acid & Base - KOH bath & NaOH work
Stangl
Stangl
A
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
Stangl
A
Details
Wet Bench - Acid & Base - Electroplating
Stangl
621
B
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
622
A
Details
Wet Bench - Acid & Base
Stangl
Stangl
A
Details
Wet Bench - Solvent - Liftoff Bath
Stangl
Wetbench
A
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
625
A
Details
Wet Bench - Acid & Base - Developer Work
Stangl
627
A
Details
Wet Bench - Solvent - Megasonic bath
Stangl
628
A
Details
Hotplate - Solar-semi
Solar-semi gmbH
QS-H-200BM
A
Details
Microscope - Olympus MX40 - III/V area
Olympus
MX40
A
Details
Microscope - Olympus MX40
Olympus
MX40
A
Details
Microscope stereo - Olympus SZX-12
Olympus
SZX-12
A
Details
Wet Bench - Acid & Base - Standard Clean baths (SC1/SC2)
Stangl
651
B
Details
Wet Bench - Acid & Base - Al-etch bath
Stangl
652
A
Details
Wet Bench - Acid & Base
Stangl
1940-40
A
Details
Wet Bench - Acid & Base
Stangl
654
A
Details
Wet Bench - Solvent - Remover Bath
Stangl
655
A
Details
Fume Hood - Acid & Base - HF & BOE Work
Stangl
656
A
Details
Fume Hood - Acid & Base - PLD target polishing
Stangl
659
A
Details
Fume Hood - Acid & Base - Wash-up
Stangl
660
A
Details
Quartz tube stocker
Stangl
Quartz tube stocker
B
Details
Furnace - Centrotherm #3-1 Al anneal
Centrotherm
Al anneal
B
Details
Furnace - Centrotherm #3-2 Au anneal
Centrotherm
Au anneal
B
Details
Furnace - Centrotherm #3-3 Hi temp anneal
Centrotherm
Hi temp anneal
B
Details
Furnace - Centrotherm #1-1 Oxidation (restricted)
Centrotherm
Dry oxidation
B
Details
Furnace - Centrotherm #1-2 Wet & dry oxidation (public)
Centrotherm
Wet oxidation
B
Details
Furnace - Centrotherm #1-3 Wet & dry oxidation
Centrotherm
Wet oxidation
B
Details
Furnace - Centrotherm #4-2 LP-TEOS
Centrotherm
LP-TEOS
C
Details
Furnace - Centrotherm #4-3 LPCVD - SiN
Centrotherm
LPCVD Furnace
C
Details
Furnace - Centrotherm #4-4 LP-Polysilicon
Centrotherm
LP-Polysilicon
C
Details
Furnace - Thermolyne - Open Tube/1600°C
Barnstead/Thermolyne
Thermolyne- M. 59340
B
Details
MBE - EPI 930
MBE
EPI 930
E
Details
Fume Hood - Solvent - Polishing preparation
Stangl
1001
A
Details
Fume hood - Solvent - Dicing preparation
Stangl
Wetbench/Fumehood
A
Details
CMP Polishing & Lapping tool - Logitech PM5 #1
Logitech
PM5
C
Details
Dicing saw - Loadpoint Microace 3+
Loadpoint
Microace 3+
C
Details
Scriber - Suss - Hard wafers
-
-
A
Details
Microscope stereo - Olympus SZX-9 - PL2
Olympus
SZX-9
A
Details
Dicing saw - Disco DAD3350
Disco
DAD3350
C
Details
Wet Bench - Acid & Base
Stangl
1109
A
Details
Wet Bench - Acid & Base
Stangl
1110
A
Details
Wet Bench - Solvent
Stangl
M
A
Details
Microscope - Olympus BX52
Olympus
BX51
A
Details
Oven - Solid Dopant Storage
-
-
C
Details
Spinner - Headway
Headway
1116
A
Details
Mask aligner - Canon PPC-210
Canon
PPC-210
C
Details
Wet Bench - Acid & Base - Developer Work
Stangl
Wetbench
A
Details
PECVD - Smoltek - Remote plasma
DCA
?
C
Details
PLD - Compex Pro 110 Laser
Lambda-Physik
Compex 110
C
Details
PLD - Small System
Chalmers/Staffan Pehrson
Generation I
C
Details
PLD - Twin System
Chalmers/Staffan Pehrson
Generation II
C
Details
PLD - Compex 205 Laser
Lambda-Physik
Compex 205
C
Details
PLD - Calas System
Chalmers/Staffan Pehrson
Generation III
C
Details
PLD - RHEED System
Chalmers/TSST
High pressure RHEED
C
Details
PLD - DCA Cluster
DCA Instruments
UHV PLD
C
Details
Sputter - DCA Cluster - Oxides
DCA
MTD 450
D
Details
Sputter - DCA Cluster - Metals
DCA
MTD 450
D
Details
Critical Point Dryer - Bal-Tec
?
?
B
Details
Wet Bench - Solvent - Chemical preparation
Stangl
-
A
Details
Wet Bench - Acid & Base - Chemical preparation
0
0
A
Details
Software - Proxecco proximity correction
PDF Solutions GmBH
Proxecco-7.0
B
Details
Ozone Cleaning - Novascan
Novascan
PSD-UVT
B
Details
Wet Bench - Acid & Base - Piranha Cleaning Bath
PM-plast
Wet bench
A
Details
Mask aligner - Suss MA 6 #2
Suss MicroTec
MA6
C
Details
Vacuum sealer
AirZero
AZ-450
A
Details
SEM - Zeiss Supra 60 VP - EDX
Zeiss
Supra 60 VP
C
Details
PLD - Carbon System
Chalmers
-
C
Details
Spinner - Suss LabSpin6
Suss
LabSpin
A
Details
CVD - Aixtron - CNT
Aixtron
Black Magic 2-inch
C
Details
Evaporator - Plassys
Plassys
MEB 550 S
D
Details
Surface Profiler - Dektak
Veeco
Veeco Dektak D150
B
Details
MBE - Riber C21
Riber
Compact 21 T-E Cluster
E
Details
Spectrometer EDX - IXRF
IXRF
-
B
Details
Dry etch ICP - STS
STS
ICP MPX
D
Details
SPM - Bruker Dimension 3100
Bruker
Dimension 3100 SPM
C
Details
SPM - Bruker Dimension ICON
Bruker
Dimension ICON
C
Details
Dry etch IBE - Oxford Ionfab 300 Plus
Oxford
Ionfab 300 Plus
D
Details
Evaporator - Lesker PVD 225 #1
Lesker
PVD 225
D
Details
Evaporator - Lesker PVD 225 #2
Lesker
PVD 225
D
Details
Vacuum oven - Fischer Scientific -Block Copolymer processing
Fischer Scientific
282A
A
Details
Furnace - Lenton
Lenton
AWF 12/65
A
Details
CMP Polishing & Lapping tool - Logitech PM5 #2
Logitech
PM5
C
Details
PPMS - Quantum Design
Quantum Design
PPMS 14T
C
Details
Scriber breaker - Loomis
Loomis
LSD-100
B
Details
Dry etch RIE - Plasma-Therm - Oxygen
Plasma Therm
BatchTop RIE
C
Details
ALD - Oxford FlexAl
Oxford Instruments
FlexAl
C
Details
Flood exposure - Bachur & Associates - DUV
Bachur & Associates
LS 150X-5C2 500W
B
Details
Spinner - Suss RCD8
Suss
RCD8
C
Details
Raman microscope - Horiba
Horiba
XploRA
B
Details
Hotplate - Wenesco - SU8/BCB
Wenesco
Custom
A
Details
Nanoimprint - CNI
NilT
CNI
B
Details
Software - GenISys BEAMER
GenISys GmbH
Proximity Correction
A
Details
Microscope - Olympus MX50 - Nano area
Olympus
MX50
A
Details
Diffractometer Xray - Panalytical X'Pert
Panalytical
X'Pert PRO MRD
C
Details
CVD - MgB2 - PVD hybrid
Chalmers
-
C
Details
Laser writer - Heidelberg Instruments DWL 2000
Heidelberg Instruments
DWL 2000
D
Details
Software - GenISys LAB
GenIsys
LAB simulation package
A
Details
CVD - MTI - Graphene
MTI Corporation
OTF-1200X-4-II-C4OV-SL
B
Details
CVD - Parylene
SCS
PDS 2010 Labcoter
A
Details
Evaporator - Lesker Nano Cr
Lesker
Nano36
B
Details
Dry etch ICP - Oxford PlasmaPro 100
Oxford Instruments
PlasmaPro 100 Cobra ICP 180
D
Details
CVD - Aixtron - Graphene
Aixtron
BM HT Pro 2-inch
C
Details
Furnace - Graphene SiC
Graphensic
-
B
Details
EBL - Raith EBPG 5200
Raith
EBPG 5200
E
Details
CVD - MTI - CNT
MTI
-
B
Details
SEM - Zeiss Supra 55 - EDX
Zeiss
Supra 55 VP
C
Details
Wafer Expander - Dynatex
Dynatex
DXE Wafer Expander
A
Details
Wet Bench - Acid & Base - BOE bath
Stangl
657
A
Details
Smoltek CVD
--
--
C
Details
Glue Dispensing System - LCD line
StepCraft 210
MetCal modell DX-250.
B
Details
Imprint
NILT
?
B