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 NameManufacturerModelCurrent toolratetype name
DetailsMicroscope - Olympus MX40 - Silicon areaOlympusMX40A
Details4-point probe - CMT SR2000NAITCMT-SR2000NB
DetailsMicroscope - Olympus MX50 - III/V areaOlympusMX50A
DetailsSurface profiler - Tencor P15KLA TencorP-15B
DetailsSEM - JEOL JSM 6301FJEOL Ltd.JSM6301FC
DetailsEllipsometer - J.A. Woollam M2000J.A. WoollamM2000C
DetailsSurface profiler - Wyko NT 1100 - OpticalVeecoNT 1100C
DetailsParameter Analyzer - Keithley 4200SCSKeithley4200-SCSB
DetailsMicroscope - Olympus MX50 - Metrology areaOlympusMX50A
DetailsMicroscope stereo - Olympus SZH-11OlympusSZH-10A
DetailsWafer Inspection System - IR--A
DetailsSoftware - SPM/AutoCADHP140B
DetailsWet Bench - Acid & Base - Developer Spinner - Delta22BLE-A
DetailsMask aligner - Suss MA/BA 6 #1Suss MicroTecMA/BA 6C
DetailsWet Bench - Acid & Base - Developer Spinner - OsirisStanglStanglA
DetailsMask aligner - Suss MJB3 UV 400 #1Karl SussMJB3C
DetailsEBL - JEOL JBX 9300FSJEOL Ltd.JBX9300FSE
DetailsSpinner - BLEBLEBLEA
DetailsSpinner - Suss LabSpin6 & Low temp hotplatesSuss Microtech-A
DetailsSpinner - Suss LabSpin6Suss Microtech-A
DetailsMask aligner - Suss MJB2Karl SussMJB2C
DetailsMask aligner - Suss MJB3 DUVKarl SussMJB3 DUVC
DetailsDry etch Stripper - TePlaTePla AG300PCC
DetailsOzone Cleaning - FHRFHR Anlagenbau GmbHUVOH 150B
DetailsSurface profiler - Tencor AS500 #1TencorAS500B
DetailsSurface profiler - Tencor AS500 #2KLA TencorAS500B
DetailsFume Hood - SolventStangleWetbenchA
DetailsFume Hood - Acid & Base - Hot Acid WorkStangl236A
DetailsEBL Sample pre-alignerChalmers MC2PAMS 1101A
DetailsMicroscope stereo - Olympus SZX-9 - PL1OlympusSZX-9A
DetailsSpinner - Polos & hotplates - Unconventional resistsPolos + BLEPolos + Delta200_HotplatesA
DetailsWet Bench - Solvent - Development work & Hot PlateStangl + BLEWetbenchA
DetailsSpinner - Suss LabSpin6 & High temp hotplatesSuss Microtech-A
DetailsWet Bench - Solvent - Developer Work StanglWetbenchA
DetailsWet Bench - Hotplate & HMDS & OvenStanglStanglA
DetailsMicroscope - Olympus MX50 - Nano areaOlympusMX50A
DetailsMask aligner - Suss MJB3 UV 400 #2Karl SussMJB3C
DetailsSubstrate bonder - Suss SB6--C
DetailsPECVD - STSSTSPECVDC
DetailsDry etch ICP - STS - Deep Silicon etchSTSSTS ICPD
DetailsSputter - FHRFHRMS150D
DetailsSputter - NORDIKONordiko2000B
DetailsRTP - STEAGSteagSHS 100MC
DetailsDry etch ICP - Oxford Plasmalab 100 - Two chambersOxford Plasma TechnologyPlasmalab 100 ICP180D
DetailsEvaporator - VarianVarianVT 118 UHVC
DetailsSputter - BalzersBalzers/PfeifferPLS 550C
DetailsFurnace - Wet oxidationChalmersFurnace for III/V materialsC
DetailsDry etch RIBE - Oxford Ionfab 300Oxford Plasma TechnologyIonfab 300C
DetailsScriber - Suss - Soft wafers--A
DetailsDry etch IBE - Oxford Ionfab 300Oxford Plasma TechnologyIonfab 300C
DetailsDry etch RIE - Advanced VacuumPlasmaTherm/Advanced VacuumBatchtop m/91C
DetailsDry etch RIE - Plasma-ThermPlasmathermBatchTop m/95C
DetailsEvaporator - AVACAVACHVC600C
DetailsEvaporator - EdwardsEdwardsAuto 306C
DetailsSputter - PfeifferPfeiffer VacuumSLS-630G "Spider"C
DetailsSputter - AJAAJA InternationalAJA Orion 6-UDD
DetailsSputter - DCA - FerroelectricsDCAMTD 620D
DetailsRTP - AccuThermo AW610 - InPAllwin21AccuThermo AW610C
DetailsRTP - AccuThermo AW610 - Wide bandgapAllwin21AccuThermo AW610C
DetailsEvaporator - Lesker SpectrosLeskerSpectrosD
DetailsRTP - JIPELEC JetFirst 100JIPELECJetFirst 100C
DetailsFurnace - Thermolyne - BCB cureBarnstead Thermolyne47900A
DetailsRTP - JIPELEC JetFirst 200JIPELECJetFirst 200C
DetailsVacuum oven - HereausHereaus#500A
DetailsSpinner - BLE & OvenStangl#501A
DetailsWet Bench - Solvent - Mask cleaningStangl505A
DetailsBuffing tool - LCtec - LCD lineLC-tec AB?C
DetailsAligner & Assembler - Ciposa - LCD lineCiposa SASwitzerlandB
DetailsVacuum packer - LCD lineMultivac509.5A
DetailsUV illumination boxSolectro AB??A
DetailsWet Bench - Solvent - Ultrasonic bath - Microwave linePM-plastWet benchA
DetailsWet Bench - Acid & Base - Developer Bath - Microwave linePM-plastWet benchA
DetailsWet Bench - Acid & Base - Developer Work - Microwave linePM-plastWet benchA
DetailsSpinner - BLE & HMDS hotplate - Microwave linePM-plastWet benchA
DetailsHotplate - Solar-semi & BLE - Microwave linePM-plastWet benchA
DetailsWet Bench - SolventStanglStanglA
DetailsWet Bench - Acid & Base - KOH bath & NaOH workStanglStangl A
DetailsWet Bench - Solvent - Ultrasonic bathStanglStanglA
DetailsWet Bench - Acid & Base - ElectroplatingStangl621B
DetailsWet Bench - Solvent - Ultrasonic bathStangl622A
DetailsWet Bench - Acid & BaseStanglStanglA
DetailsWet Bench - Solvent - Liftoff BathStanglWetbenchA
DetailsWet Bench - Solvent - Ultrasonic bathStangl625A
DetailsWet Bench - Acid & Base - Developer WorkStangl627A
DetailsWet Bench - Solvent - Megasonic bathStangl628A
DetailsHotplate - Solar-semiSolar-semi gmbHQS-H-200BMA
DetailsMicroscope - Olympus MX40 - III/V areaOlympusMX40A
DetailsMicroscope - Olympus MX40OlympusMX40A
DetailsMicroscope stereo - Olympus SZX-12OlympusSZX-12A
DetailsWet Bench - Acid & Base - Standard Clean baths (SC1/SC2)Stangl651B
DetailsWet Bench - Acid & Base - Al-etch bathStangl652A
DetailsWet Bench - Acid & BaseStangl1940-40A
DetailsWet Bench - Acid & BaseStangl654A
DetailsWet Bench - Solvent - Remover BathStangl655A
DetailsFume Hood - Acid & Base - HF & BOE WorkStangl656A
DetailsFume Hood - Acid & Base - PLD target polishingStangl659A
DetailsFume Hood - Acid & Base - Wash-upStangl660A
DetailsFurnace - Centrotherm #3-1 Al annealCentrothermAl annealB
DetailsFurnace - Centrotherm #3-2 Au annealCentrothermAu annealB
DetailsFurnace - Centrotherm #3-3 Hi temp annealCentrothermHi temp annealB
DetailsFurnace - Centrotherm #1-1 Oxidation (restricted)CentrothermDry oxidationB
DetailsFurnace - Centrotherm #1-2 Wet & dry oxidation (public)CentrothermWet oxidationB
DetailsFurnace - Centrotherm #1-3 Wet & dry oxidationCentrothermWet oxidationB
DetailsFurnace - Centrotherm #4-2 LP-TEOSCentrothermLP-TEOSC
DetailsFurnace - Centrotherm #4-3 LPCVD - SiNCentrothermLPCVD FurnaceC
DetailsFurnace - Centrotherm #4-4 LP-PolysiliconCentrothermLP-PolysiliconC
DetailsFurnace - Thermolyne - Open Tube/1600°CBarnstead/ThermolyneThermolyne- M. 59340B
DetailsMBE - EPI 930MBEEPI 930E
DetailsFume Hood - Solvent - Polishing preparationStangl1001A
DetailsFume hood - Solvent - Dicing preparationStanglWetbench/FumehoodA
DetailsCMP Polishing & Lapping tool - Logitech PM5 #1LogitechPM5C
DetailsDicing saw - Loadpoint Microace 3+LoadpointMicroace 3+C
DetailsScriber - Suss - Hard wafers--A
DetailsMicroscope stereo - Olympus SZX-9 - PL2OlympusSZX-9A
DetailsDicing saw - Disco DAD3350DiscoDAD3350C
DetailsWet Bench - Acid & BaseStangl1110A
DetailsWet Bench - SolventStanglMA
DetailsMicroscope - Olympus BX52OlympusBX51A
DetailsSpinner - HeadwayHeadway1116A
DetailsMask aligner - Canon PPC-210CanonPPC-210C
DetailsWet Bench - Acid & Base - Developer WorkStanglWetbenchA
DetailsPECVD - Smoltek - Remote plasmaDCA?C
DetailsPLD - Compex Pro 110 LaserLambda-PhysikCompex 110C
DetailsPLD - Small SystemChalmers/Staffan PehrsonGeneration IC
DetailsPLD - Twin SystemChalmers/Staffan PehrsonGeneration IIC
DetailsPLD - Compex 205 LaserLambda-PhysikCompex 205C
DetailsPLD - Calas SystemChalmers/Staffan PehrsonGeneration IIIC
DetailsPLD - RHEED SystemChalmers/TSSTHigh pressure RHEEDC
DetailsPLD - DCA ClusterDCA InstrumentsUHV PLDC
DetailsSputter - DCA Cluster - OxidesDCAMTD 450D
DetailsSputter - DCA Cluster - MetalsDCAMTD 450D
DetailsCritical Point Dryer - Bal-Tec??B
DetailsWet Bench - Solvent - Chemical preparation Stangl-A
DetailsWet Bench - Acid & Base - Chemical preparation00A
DetailsSoftware - Proxecco proximity correctionPDF Solutions GmBHProxecco-7.0B
DetailsOzone Cleaning - NovascanNovascanPSD-UVTB
DetailsWet Bench - Acid & Base - Piranha Cleaning BathPM-plastWet benchA
DetailsMask aligner - Suss MA 6 #2Suss MicroTecMA6C
DetailsVacuum sealerAirZeroAZ-450A
DetailsSEM - Zeiss Supra 60 VP - EDXZeissSupra 60 VPC
DetailsPLD - Carbon SystemChalmers-C
DetailsSpinner - Suss LabSpin6SussLabSpinA
DetailsCVD - Aixtron - CNTAixtronBlack Magic 2-inchC
DetailsEvaporator - PlassysPlassysMEB 550 SD
DetailsSurface Profiler - DektakVeecoVeeco Dektak D150B
DetailsMBE - Riber C21RiberCompact 21 T-E ClusterE
DetailsSpectrometer EDX - IXRFIXRF-B
DetailsDry etch ICP - STSSTSICP MPXD
DetailsSPM - Bruker Dimension 3100BrukerDimension 3100 SPMC
DetailsSPM - Bruker Dimension ICONBrukerDimension ICONC
DetailsDry etch IBE - Oxford Ionfab 300 PlusOxfordIonfab 300 PlusD
DetailsEvaporator - Lesker PVD 225 #1LeskerPVD 225D
DetailsEvaporator - Lesker PVD 225 #2LeskerPVD 225D
DetailsVacuum oven - Fisher Scientific -Block Copolymer processingFisher Scientific282AA
DetailsFurnace - LentonLentonAWF 12/65A
DetailsCMP Polishing & Lapping tool - Logitech PM5 #2LogitechPM5C
DetailsPPMS - Quantum DesignQuantum DesignPPMS 14TC
DetailsScriber breaker - LoomisLoomisLSD-100B
DetailsDry etch RIE - Plasma-Therm - OxygenPlasma ThermBatchTop RIEC
DetailsALD - Oxford FlexAlOxford InstrumentsFlexAlC
DetailsFlood exposure - Bachur & Associates - DUVBachur & AssociatesLS 150X-5C2 500WB
DetailsSpinner - Suss RCD8SussRCD8C
DetailsRaman microscope - HoribaHoribaXploRAB
DetailsHotplate - Wenesco - SU8/BCBWenescoCustomA
DetailsNanoimprint - CNI v1NILTCNIB
DetailsSoftware - GenISys BEAMERGenISys GmbHProximity CorrectionA
DetailsMicroscope - Olympus MX50 - Nano areaOlympusMX50A
DetailsDiffractometer Xray - Panalytical X'PertPanalyticalX'Pert PRO MRDC
DetailsCVD - MgB2 - PVD hybridChalmers-C
DetailsLaser writer - Heidelberg Instruments DWL 2000Heidelberg InstrumentsDWL 2000D
DetailsSoftware - GenISys LABGenIsysLAB simulation packageA
DetailsCVD - MTI - GrapheneMTI CorporationOTF-1200X-4-II-C4OV-SLB
DetailsCVD - ParyleneSCSPDS 2010 LabcoterA
DetailsEvaporator - Lesker Nano CrLeskerNano36B
DetailsDry etch ICP - Oxford PlasmaPro 100Oxford InstrumentsPlasmaPro 100 Cobra ICP 180D
DetailsCVD - Aixtron - GrapheneAixtronBM HT Pro 2-inchC
DetailsFurnace - Graphene SiCGraphensic-B
DetailsEBL - Raith EBPG 5200RaithEBPG 5200E
DetailsCVD - MTI - CNTMTI-B
DetailsSEM - Zeiss Supra 55 - EDXZeissSupra 55 VPC
DetailsWafer Expander - DynatexDynatexDXE Wafer ExpanderA
DetailsWet Bench - Acid & Base - BOE bathStangl657A
DetailsSmoltek CVD----C
DetailsGlue Dispensing System - LCD line StepCraft 210MetCal modell DX-250.B
DetailsNanoimprint - CNI v2NILTCNIB
DetailsMicroscope Automatic - Nikon L200NDNikonL200NDB
DetailsMaskless lithography - SmartPrintMicrolight 3DSmartPrintB
DetailsDry etch RIBE - NILTOxford InstrumentsIonfabD
DetailsSteam productionN/AN/AA
DetailsGasesN/AN/AA
DetailsChemicalsN/AN/AA
DetailsScrubbersN/AN/AA
DetailsTool installationsN/AN/AA
DetailsProcess cooling systemN/AN/AA
DetailsHouse vacuum systemN/AN/AA
DetailsCompressed Dry AirN/AN/AA
DetailsDI Water systemN/AN/AA
DetailsIntercom Set 1, blackEartec UltraLITE UL5S HD Kit A
DetailsMCC115 PL1 Group 1Chalmers1A
DetailsMCC115 PL1 Group 2Chalmers2A
DetailsMCC115 PL2 Group 1Chalmers3A
DetailsTripodSamsungS10A
DetailsPC monitor 43"DellDell 43'' UltraSharp U4320Q 4K USB-CA
DetailsMobile phoneSamsungS10A
DetailsLaminator for SUEX Dry Film PhotoresistGBC PRO SERIES 3600A
DetailsCritical point dryer - TousimisTousimisAutosamdri 931 GLA
DetailsCVD - 2D materialsCarboliteEZS-3G 12/600B 1200CA
DetailsWhite Light Reflectance Spectroscopy (WLRS) - ThetaMetrisis Theta MetrisisFR-Pro-UV/VISA
DetailsIntercom Set 2, yellowEartec UltraLITE UL5S HD Kit A
DetailsPECVD - OxfordOxford Instruments??C
DetailsDry Etch ICP - Oxford - Deep Silicon etchOxford Instruments??D
DetailsLaser Writer - Heidelberg Instruments MLA 150Heidelberg InstrumentsMLA 150C
DetailsFan exhaust systems, floor 9N/AN/AA
DetailsSolvent waste tankN/AN/AA
DetailsNeutralization waste tankN/AN/AA
DetailsEmergency diesel generatorN/AN/AA
DetailsTransfer stage - Manual for 2D and 1D materials ??A
DetailsX-ray photoemission spectroscopy – Scienta OmicronScienta-Omicron GmbHArgus CUC
DetailsChip scanner - RaithRaith?D
DetailsUPSN/AN/AA
DetailsGas detection alarmHoneywellN/AA
DetailsEllipsometer - J.A. Woollam RC2J. A. WoollamRC2C