Processing competence: Has expertise in electron beam lithography processing and process optimization in deep sub-micron range. Proximity effects compensation based on experimental and theoretical proximity function evaluation. Proximity compensated three dimensional pattering for diffractive optical elements fabrication. Sub-micron pattern transfer by wet and dry plasma/ion etching. State-of-the-art sub-20nm negative and positive pattering by electron beam lithography.
Tel: +46 31 772 49 86
Mobile: +46 70 3088986
List of tools where Piotr Jedrasik is tool responsible