LIST_TYPE_PREDEFINED_LIST Dry etching

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Dry etching

Dry Etching

Dry etching, i.e., etching under vacuum with reactive gases, is used to remove material and to create the wanted topography. Our precision dry etching tools feature state-of-the-art processes with end point detection. We have the appropriate processes for conventional structures in Si, and compound semiconductor materials, for deep Si structures, and for meals and dielectrics.