Processing competence: Has 20 years experience and expertise in electron beam lithography processing and process optimization in deep sub-micron range, as well as in interaction with lab users and project planning. Pattern data and job file pre-processing for e-beam exposure, proximity effects compensation based on experimental and theoretical proximity function evaluation. Sub-micron pattern transfer by wet and dry plasma/ion etching. State-of-the-art sub-20nm negative and positive pattering by electron beam lithography.
Tel: +46 31 772 84 80
Mobile: +46 70-3088318
List of tools where Bengt Nilsson is tool responsible